Compounds similar to this structure
CCO[Si](OCC)(OCC)OCC.C[SiH](C)ClEdit in Covalent
21 compounds score at least 30 % on Tanimoto similarity of circular fingerprints, most similar first.
Silicic acid (H4sio4), tetraethyl ester, reaction products with chlorodimethylsilane68988-57-8100 % similar
Tetraethyl orthosilicate78-10-460 % similar
Chlorodimethylsilane1066-35-945 % similar
Chlorotriethoxysilane4667-99-640 % similar
(Chloromethyl)triethoxysilane15267-95-537 % similar
Bis(triethoxysilyl)ethane16068-37-436 % similar
Trimethylethoxysilane1825-62-336 % similar
Triethoxymethylsilane2031-67-636 % similar
Dimethyldiethoxysilane78-62-636 % similar
Triethoxyfluorosilane358-60-135 % similar
Ethyltriethoxysilane78-07-935 % similar
(Chloromethyl)diethoxymethylsilane2212-10-434 % similar
(3-Chloropropyl)triethoxysilane5089-70-332 % similar
Propyltriethoxysilane2550-02-932 % similar
1,1,1-Triethoxy-N,N-diethylsilanamine35077-00-031 % similar
Vinyltriethoxysilane78-08-031 % similar
Ethoxydimethylsilane14857-34-231 % similar
Methyldiethoxysilane2031-62-131 % similar
Tetrapropoxysilane682-01-931 % similar
(3-Chloropropyl)diethoxymethylsilane13501-76-330 % similar
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