Compounds similar to this structure
CCO[Si](C)(CCl)OCCEdit in Covalent
35 compounds score at least 30 % on Tanimoto similarity of circular fingerprints, most similar first.
(Chloromethyl)diethoxymethylsilane2212-10-4100 % similar
(Chloromethyl)triethoxysilane15267-95-557 % similar
(3-Chloropropyl)diethoxymethylsilane13501-76-356 % similar
γ-Aminopropylmethyldiethoxysilane3179-76-845 % similar
Trimethylethoxysilane1825-62-343 % similar
Triethoxymethylsilane2031-67-643 % similar
Dimethyldiethoxysilane78-62-643 % similar
Chlorotriethoxysilane4667-99-642 % similar
Tetraethyl orthosilicate78-10-441 % similar
(3-Chloropropyl)triethoxysilane5089-70-338 % similar
Bis(triethoxysilyl)ethane16068-37-438 % similar
γ-Glycidoxypropylmethyldiethoxysilane2897-60-136 % similar
1,3-Bis(chloromethyl)-1,1,3,3-tetramethyldisiloxane2362-10-936 % similar
Triethoxyfluorosilane358-60-136 % similar
Ethyltriethoxysilane78-07-936 % similar
(Trimethylsilyl)methyl chloride2344-80-135 % similar
Bis(chloromethyl)dimethylsilane2917-46-635 % similar
Vinyldimethylethoxysilane5356-83-234 % similar
Vinylmethyldiethoxysilane5507-44-834 % similar
Silicic acid (H4sio4), tetraethyl ester, reaction products with chlorodimethylsilane68988-57-834 % similar
Page 1 of 2