Compound database

Compounds similar to this structure

H2NOHNc1ccc(CO)cc1Edit in Covalent

200 compounds score at least 30 % on Tanimoto similarity of circular fingerprints, most similar first.

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4-Decylaniline37529-30-941 % similar 4-Ethoxybenzyl alcohol6214-44-441 % similar 4-(Hydroxymethyl)phenylacetic acid73401-74-841 % similar 4-Hydroxymethylbenzoic acid96937-45-041 % similar 3,4-Dihydroxybenzyl alcohol3897-89-041 % similar [2,2'-Bipyridine]-5,5'-dimethanol63361-65-941 % similar 4-(4-Aminophenyl)butanoic acid15118-60-241 % similar Wang resin201058-08-441 % similar (2-Aminopyridin-4-yl)methanol105250-17-740 % similar 4-(Trifluoromethoxy)benzenemethanol1736-74-940 % similar 4-((Trifluoromethyl)thio)benzenemethanol56456-52-140 % similar 4-Nitrobenzyl alcohol619-73-840 % similar 4-(Difluoromethoxy)benzyl alcohol659-33-640 % similar 2-Naphthalenemethanol1592-38-739 % similar 3,4-Dichlorobenzenemethanol1805-32-939 % similar 3,4-Dimethylbenzyl alcohol6966-10-539 % similar 3,4-Difluorobenzenemethanol85118-05-439 % similar 4-(Morpholinomethyl)aniline51013-67-339 % similar 1,4-Benzenediamine sulfate16245-77-538 % similar 4-Cyclopropylaniline3158-71-238 % similar